高纯实验室钨靶材（W）

Tungsten (W) sputtering targets are essential materials in the field of thin film deposition, particularly in the semiconductor industry. Known for their exceptionally high melting point (approximately 3422 °C) and excellent electrical conductivity, tungsten targets are ideal for applications requiring durability and thermal stability. 

They are commonly used in physical vapor deposition (PVD) processes to create high-quality coatings for electronic components, solar cells, and optical devices. Tungsten's robust mechanical properties and resistance to corrosion further enhance its effectiveness in demanding environments, making it a preferred choice for advanced manufacturing processes.

Note: Purity, shape, thickness, and dimensions can all be customized,Please feel free to contact us for more details.

To receive a prompt quotation and expedited delivery, please provide complete target material specifications. This includes details on purity, dimensions, tolerance requirements, and any other technical specifications.