High Purity Boron B Sputtering Target Customized

B Target Product Details

Boron Target is a material used for film deposition, widely applied in the semiconductor, optoelectronic, and materials science fields. Its primary function is to serve as a dopant and film growth source, helping to improve the electrical properties of semiconductor materials and to manufacture high-performance films.

Note: Purity, shape, thickness, and dimensions can all be customized,Please feel free to contact us for more details.

B Target Physical and Chemical Properties

- Appearance: Boron targets typically appear as solid blocks or discs with high purity.

- Melting Point: Boron has a high melting point of about 2075 °C, ensuring stability during high-temperature production processes.

- Conductivity: As a dopant, boron can significantly adjust the conductivity of semiconductors.

Applications of B Targets

The main applications of boron targets include:

1. Dopant:

   - Boron is used for doping semiconductor materials such as silicon (Si) and germanium (Ge), improving their conductivity and performance.

2. Film Deposition:

   - In techniques like magnetron sputtering and chemical vapor deposition (CVD), boron targets are used to create high-performance boron-doped films.

3. New Material Development:

   - Boron targets are also utilized in the development of new semiconductor materials like boron nitride (BN), which exhibit excellent optoelectronic properties.

Summary

Boron targets, with their superior physical and chemical properties, demonstrate significant application potential in the semiconductor and optoelectronic fields, supporting the research and manufacturing of high-performance electronic devices.

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