High Purity Chromium Cr Sputtering Target Customized

Chromium Target Product Details

Chromium targets are materials used in PVD (Physical Vapor Deposition) technology for thin film production, with wide applications in semiconductor manufacturing, optical coatings, and disk manufacturing. Typically, chromium targets feature high purity, uniform chemical composition, and good processing performance and stability.

Note: Purity, shape, thickness, and dimensions can all be customized,Please feel free to contact us for more details.

Properties of Chromium Targets

1. Chemical Uniformity: Chromium targets exhibit excellent chemical composition uniformity, allowing for the production of chemically consistent and physically stable films.

2. High Density: The high density of chromium targets enhances the adhesion and corrosion resistance of the resulting films.

3. High Melting Point: The high melting point of chromium targets ensures good high-temperature performance in PVD processes.

Applications of Chromium Targets

1. Semiconductor Manufacturing: Chromium targets are widely used in the production of integrated circuits and other semiconductor devices.

2. Optical Coatings: In the field of optical coatings, chromium targets are employed to produce mirror films and reflective coatings.

3. Disk Manufacturing: In disk manufacturing, chromium targets are used to produce components such as read/write heads.

Role of Chromium Targets in PVD Technology

In PVD technology, chromium targets are placed in a vacuum chamber where high-energy particles bombard the target surface, releasing atoms that then deposit onto the substrate. As one of the target materials in PVD, chromium is primarily used to fabricate high-purity chromium metal films, silicon-based films, and dielectric materials. Additionally, chromium targets can be utilized to create multilayer films and composite films.

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