High Purity Tantalum (Ta) Sputtering Targets Customized

tantalum (Ta) sputtering targets are used in the semiconductor industry. Tantalum possesses several properties that make it suitable for various semiconductor applications:

High Melting Point: Tantalum has a high melting point (approximately 3017 °C), which makes it stable during high-temperature processes.

Note: Purity, shape, thickness, and dimensions can all be customized,Please feel free to contact us for more details.

To receive a prompt quotation and expedited delivery, please provide complete target material specifications. This includes details on purity, dimensions, tolerance requirements, and any other technical specifications.

Excellent Conductivity: Tantalum has good electrical conductivity, making it useful for interconnects and other conductive layers in semiconductor devices.

Chemical Stability: Tantalum is highly resistant to corrosion and oxidation, ensuring the reliability of thin films in semiconductor applications.

Barrier Layers: Tantalum is often used as a barrier layer in copper interconnects to prevent copper diffusion into silicon, which is critical for maintaining device integrity and performance.

Capacitors: Tantalum is commonly used in the production of tantalum capacitors, which are essential components in various electronic devices.

Summary

Tantalum sputtering targets play a significant role in the fabrication of semiconductor devices, particularly in enhancing performance and reliability through their unique properties. Their applications in barrier layers, capacitors, and conductive films highlight their importance in modern semiconductor technology.

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