Element Symbol: MoSi2-Ev
CAS: 7631-86-9
Model: Sup-MoSi2-Ev
Purity: 4N, 3N5,3N
Shape: Particles
Thickness: [N/A]
Dimension: [N/A]
(Note: Purity, shape, thickness, and dimensions can all be customized)
Product Details:
### Physical Properties
1. Appearance
- SiO₂ is typically a colorless or white solid, which can exist in granular, powdered, or crystalline forms.
2. Melting Point
- The melting point of SiO₂ is approximately 1713°C (about 3115°F).
3. Density
- The density of anhydrous SiO₂ is about 2.65 g/cm³.
4. Hardness
- On the Mohs scale, SiO₂ has a hardness of 7, indicating good wear resistance.
5. Solubility
- SiO₂ is nearly insoluble in water but can dissolve in strong acids (like hydrofluoric acid) and strong bases.
### Chemical Properties
1. Stability
- SiO₂ is very chemically stable at room temperature and does not readily react with other substances.
2. Acid-Base Nature
- SiO₂ is a weakly acidic substance and can react with strong bases to form silicates.
3. Reactivity
- At high temperatures, SiO₂ can react with metals to form metal silicates.
4. Thermal Conductivity
- SiO₂ has low thermal conductivity, approximately 1.3 W/(m·K), making it a good insulating material.
5. Electrical Insulation
- SiO₂ possesses excellent electrical insulation properties, commonly used in electrical and electronic applications.
### Crystalline Forms
- SiO₂ exists in several crystalline forms, the most common of which are quartz (α- and β-quartz) and amorphous silica (such as silica gel).
### Other Characteristics
1. Hygroscopicity
- Amorphous SiO₂ has good hygroscopic properties, often used as a desiccant.
2. Optical Properties
- SiO₂ has good transparency in the ultraviolet and visible light ranges, widely used in optical devices.
Applications of SiO2 Granule:
### Semiconductor Field
1. Insulating Material
- Gate Oxide Layer in MOSFETs: SiO₂ layers provide electrical insulation, ensuring the switching performance of the device.
2. Dielectric Material
- Capacitors: SiO₂ serves as a dielectric, enhancing the storage capacity and performance stability of capacitors.
3. Photolithography Technology
- Bottom Layer for Photoresist: Used as the foundational layer for pattern formation, helping to improve resolution and precision.
4. Protective Layer
- Preventing Contamination: The SiO₂ layer protects the wafer from contamination and physical damage during manufacturing.
5. Thin Film Deposition
- Chemical Vapor Deposition (CVD): Used to deposit high-quality SiO₂ films as a substrate for other materials.
### Materials Science Field
1. Filler Material
- Polymer Composites: SiO₂ particles enhance the strength and toughness of polymers, used in automotive and aerospace industries.
2. Ceramic Materials
- High-Temperature Ceramics: SiO₂ increases the thermal resistance of ceramics, used in furnace and insulation materials.
3. Polishing Material
- CMP Process: SiO₂ particles are used for chemical mechanical polishing of semiconductor wafers, ensuring surface flatness.
### Other Fields
1. Construction Materials
- Cement and Concrete: SiO₂ acts as an admixture, improving the strength and durability of concrete.
2. Food Industry
- Anti-Caking Agent: In seasonings and powdered foods, SiO₂ prevents clumping and improves flowability.
3. Optical Materials
- Optical Glass: The high transparency of SiO₂ makes it an important component in the manufacture of lenses and optical instruments.
4. Cosmetics
- Thickening Agent: SiO₂ is used in creams and cosmetics to enhance texture and application.
5. Chemical Catalysis
- Catalyst Support: In petrochemicals, SiO₂ serves as a support for catalysts, improving catalytic efficiency.
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