High Purity SiO2 Granule Particles for Thin Film Deposition Research

Product Details:

### Physical Properties

1. Appearance  

   - SiO₂ is typically a colorless or white solid, which can exist in granular, powdered, or crystalline forms.

2. Melting Point  

   - The melting point of SiO₂ is approximately 1713°C (about 3115°F).

3. Density  

   - The density of anhydrous SiO₂ is about 2.65 g/cm³.

4. Hardness  

   - On the Mohs scale, SiO₂ has a hardness of 7, indicating good wear resistance.

5. Solubility  

   - SiO₂ is nearly insoluble in water but can dissolve in strong acids (like hydrofluoric acid) and strong bases.

### Chemical Properties

1. Stability  

   - SiO₂ is very chemically stable at room temperature and does not readily react with other substances.

2. Acid-Base Nature  

   - SiO₂ is a weakly acidic substance and can react with strong bases to form silicates.

3. Reactivity  

   - At high temperatures, SiO₂ can react with metals to form metal silicates.

4. Thermal Conductivity  

   - SiO₂ has low thermal conductivity, approximately 1.3 W/(m·K), making it a good insulating material.

5. Electrical Insulation  

   - SiO₂ possesses excellent electrical insulation properties, commonly used in electrical and electronic applications.

### Crystalline Forms

- SiO₂ exists in several crystalline forms, the most common of which are quartz (α- and β-quartz) and amorphous silica (such as silica gel).

### Other Characteristics

1. Hygroscopicity  

   - Amorphous SiO₂ has good hygroscopic properties, often used as a desiccant.

2. Optical Properties  

   - SiO₂ has good transparency in the ultraviolet and visible light ranges, widely used in optical devices.

Applications of  SiO2 Granule:

### Semiconductor Field

1. Insulating Material  

   - Gate Oxide Layer in MOSFETs: SiO₂ layers provide electrical insulation, ensuring the switching performance of the device.

2. Dielectric Material  

   - Capacitors: SiO₂ serves as a dielectric, enhancing the storage capacity and performance stability of capacitors.

3. Photolithography Technology  

   - Bottom Layer for Photoresist: Used as the foundational layer for pattern formation, helping to improve resolution and precision.

4. Protective Layer  

   - Preventing Contamination: The SiO₂ layer protects the wafer from contamination and physical damage during manufacturing.

5. Thin Film Deposition  

   - Chemical Vapor Deposition (CVD): Used to deposit high-quality SiO₂ films as a substrate for other materials.

### Materials Science Field

1. Filler Material  

   - Polymer Composites: SiO₂ particles enhance the strength and toughness of polymers, used in automotive and aerospace industries.

2. Ceramic Materials  

   - High-Temperature Ceramics: SiO₂ increases the thermal resistance of ceramics, used in furnace and insulation materials.

3. Polishing Material  

   - CMP Process: SiO₂ particles are used for chemical mechanical polishing of semiconductor wafers, ensuring surface flatness.

### Other Fields

1. Construction Materials  

   - Cement and Concrete: SiO₂ acts as an admixture, improving the strength and durability of concrete.

2. Food Industry  

   - Anti-Caking Agent: In seasonings and powdered foods, SiO₂ prevents clumping and improves flowability.

3. Optical Materials  

   - Optical Glass: The high transparency of SiO₂ makes it an important component in the manufacture of lenses and optical instruments.

4. Cosmetics  

   - Thickening Agent: SiO₂ is used in creams and cosmetics to enhance texture and application.

5. Chemical Catalysis  

   - Catalyst Support: In petrochemicals, SiO₂ serves as a support for catalysts, improving catalytic efficiency.

Office Photo

Exhibition