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High Purity 5N Aluminum Al Sputtering Targets Customized

Element Symbol:Aluminum(Al)
CAS:[N/A]
Model:Sup-Al
Purity:2N7, 4N, 4N5, 5N
Shape:Round
Thickness:[N/A]
Dimension:[N/A]
(Note: Purity, shape, thickness, and dimensions can all be customized)

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Aluminum (Al) is a silvery-white lightweight metal known for its excellent electrical conductivity, corrosion resistance, and outstanding machinability. With a low density (approximately 2.7 g/cm³) and superior mechanical properties, aluminum is widely used across various industrial sectors, particularly in the semiconductor and electronics industries. Its properties make it an ideal material for applications requiring lightweight and durable solutions.

   

Note: Purity, shape, thickness, and dimensions can all be customized,Please feel free to contact us for more details.

Purity (%)ShapeManufacturing processMax. Size
99.999%, 99.995%, 99.99%, 99.7%

Plane target, Cylindrical target,

 Arc target, Custom-shaped target

Vacuum Melting,PMCustomized

To receive a prompt quotation and expedited delivery, please provide complete target material specifications. This includes details on purity, dimensions, tolerance requirements, and any other technical specifications.

Main Characteristics

- Lightweight: Aluminum has a low density, making it advantageous for applications that require weight reduction.

Good Electrical Conductivity: Aluminum has high electrical conductivity, making it an ideal material for electrical interconnects and conductive layers.

Corrosion Resistance: The naturally formed oxide layer on aluminum effectively prevents corrosion, making it suitable for various environments.

Ease of Processing: Aluminum is easy to shape and process, making it suitable for various manufacturing techniques.

Main Applications of Aluminum sputtering targets

Semiconductor Manufacturing: Aluminum sputtering targets are used in thin film deposition processes as electrodes and conductive layers to ensure the stability and reliability of devices.

PVD Coatings: Aluminum sputtering targets are widely used in physical vapor deposition (PVD) processes to form wear-resistant and corrosion-resistant films.

Electronic Devices: Aluminum is used in the manufacture of capacitors and other electronic components to achieve good electrical performance.

Summary

Aluminum sputtering targets, with their excellent physical and chemical properties, have broad application prospects in the semiconductor, electronics, and other industrial fields, making them an indispensable material in modern manufacturing.


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