High Purity 3N 99.9% Chromium Aluminum(CrAl) Alloy Sputtering Target Cr-Al-ST Customizable

Element Symbol: AlCr
CAS: [N/A]
Model: Sup-AlCr
Purity: 3N5,3N, 2N8,2N5
Shape: Round
Thickness: [N/A]
Dimension: [N/A]
(Note: Purity, shape, thickness, and dimensions can all be customized)

Chromium-aluminum alloy (CrAl) sputtering targets are primarily used in physical vapor deposition (PVD) processes. Through methods such as sputtering or evaporation, they deposit a thin film of chromium-aluminum alloy onto a substrate, imparting specific properties. These films exhibit excellent wear resistance, corrosion resistance, high-temperature resistance, and decorative properties.

Note: Purity, shape, thickness, and dimensions can all be customized,Please feel free to contact us for more details.

Properties	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/ 99.9/ 99.95	99.8/ 99.9/ 99.95	99.8/ 99.9/ 99.95
Density(g/cm3)	3.7	4.35	4.55
Grain Size(μm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Our company manufactures AlCr sputtering targets with superior mechanical properties, effectively preventing target breakage. The complete melting of the powder significantly reduces droplet formation during use, resulting in a smoother deposited coating. These targets are widely used in tooling applications.

To receive a prompt quotation and expedited delivery, please provide complete target material specifications. This includes details on purity, dimensions, tolerance requirements, and any other technical specifications.

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