High Purity Nickel Vanadium Alloy (NiV) Sputtering Target Customized

Nickel Vanadium Alloy (NiV) Sputtering Target Description

The Nickel Vanadium Alloy (NiV) sputtering target is a specialized material used in the physical vapor deposition (PVD) process for thin film applications. This alloy combines the excellent corrosion resistance and electrical conductivity of nickel with the enhanced mechanical properties of vanadium.

Note: Purity, shape, thickness, and dimensions can all be customized,Please feel free to contact us for more details.

To receive a prompt quotation and expedited delivery, please provide complete target material specifications. This includes details on purity, dimensions, tolerance requirements, and any other technical specifications.

Main Characteristics

- Enhanced Durability: The NiV alloy exhibits superior wear resistance, making it ideal for applications that require long-lasting performance.

- Good Conductivity: With excellent electrical conductivity, the NiV target is suitable for use as an electrode material in semiconductor devices.

- High Temperature Stability: The alloy maintains its structural integrity and performance even at elevated temperatures, making it suitable for high-temperature applications.

Main Applications

Nickel Vanadium Alloy sptionsuttering targets are widely used in the semiconductor industry for the deposition of conductive films, as well as in other advanced applications such as coatings for aerospace and automotive components. Their unique properties make them valuable for enhancing the performance and reliability of electronic devices.

Summary

Copper sputtering targets, with their excellent electrical and thermal properties, have broad application prospects in the semiconductor, electronics, and optoelectronics fields. Their indispensable role in modern manufacturing highlights the importance of copper as a key material in various technological advancements.

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