Aluminum-Nickel AlNi Alloy Sputtering Targets Laboratory Research Needs Customizable

Discover our high-purity aluminum-nickel alloy targets, specifically designed for advanced laboratory applications. With exceptional quality and precision, these sputtering targets are ideal for materials research, semiconductor processes, and custom thin-film deposition. Explore our range of Al-Ni alloy targets to enhance your experimental outcomes. Contact us for tailored solutions and specifications that meet your unique research needs.

Note: Purity, shape, thickness, and dimensions can all be customized,Please feel free to contact us for more details.

Nickel-aluminum alloy targets are produced by melting high-purity aluminum and nickel in specified proportions under high vacuum conditions to obtain nickel-aluminum ingots. These ingots are then machined to create aluminum-nickel targets. Nickel-aluminum alloy targets have advantages such as high density, no porosity, no looseness or segregation, fine grain structure, and uniform organization.

Due to the high bonding strength between the nickel-aluminum alloy coating and the substrate, they are widely used for base coatings. The coatings exhibit good oxidation resistance and can operate at temperatures below 700°C. As the excellent performance of nickel-aluminum coatings is further explored, their application in the field of molds and tools has been widely promoted.

To receive a prompt quotation and expedited delivery, please provide complete target material specifications. This includes details on purity, dimensions, tolerance requirements, and any other technical specifications.

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