High Purity Nickel Iron Alloy NiFe Sputtering Target Customized

Nickel Iron (NiFe) Alloy Sputtering Target Description：

Nickel Iron (NiFe) alloy sputtering target is a specialized material used in the physical vapor deposition (PVD) process for thin film applications. This alloy combines the excellent electrical conductivity of nickel with the ferromagnetic properties of iron, making it ideal for various electronic and magnetic devices.

Note: Purity, shape, thickness, and dimensions can all be customized,Please feel free to contact us for more details.

To receive a prompt quotation and expedited delivery, please provide complete target material specifications. This includes details on purity, dimensions, tolerance requirements, and any other technical specifications.

Main Characteristics

- Excellent Electrical Conductivity: NiFe alloy exhibits good electrical conductivity, making it suitable for use as an electrode material.

- Soft Magnetic Properties: The alloy demonstrates excellent soft magnetic properties, ideal for manufacturing inductors and magnetic storage devices.

- Wear Resistance: The wear resistance of nickel iron alloy provides lasting stability in high-performance applications.

Main Applications

Nickel Vanadium Alloy sptionsuttering targets are widely used in the semiconductor industry for the deposition of conductive films, as well as in other advanced applications such as coatings for aerospace and automotive components. Their unique properties make them valuable for enhancing the performance and reliability of electronic devices.

Summary

NiFe alloy target materials are widely used in semiconductor manufacturing, magnetic materials, and high-frequency equipment to improve the performance and stability of devices.

Office Photo

Exhibition