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High Purity Aluminum-Manganese AlMn Sputtering Target for PVD Thin Film Deposition

Element Symbol: AlMn
CAS: [N/A]
Model: Sup-AlMn
Purity: 4N, 3N5,3N, 2N8,2N5
Shape: Round
Thickness: [N/A]
Dimension: [N/A]
(Note: Purity, shape, thickness, and dimensions can all be customized)

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Aluminum-manganese (AlMn) alloy sputtering targets are crucial materials in various thin-film deposition techniques, particularly physical vapor deposition (PVD).  Their unique combination of properties makes them suitable for diverse applications, ranging from microelectronics to aerospace engineering. 

Note: Purity, shape, thickness, and dimensions can all be customized,Please feel free to contact us for more details.

### Composition and Properties

AlMn alloys are primarily composed of aluminum and manganese, but the precise composition significantly impacts the final properties. The aluminum content typically ranges from 85% to 95%, with the remaining percentage being manganese.  However, trace elements might be added to tailor specific properties like corrosion resistance or ductility.  The resulting alloy's properties are highly dependent on this composition and the manufacturing process.

-Density:  The density typically falls within the range of 2.6 to 2.8 g/cm³, slightly higher than pure aluminum due to the addition of manganese.  This density variation is directly related to the alloy's composition.

-Melting Point: The melting point is not a single value but a range, determined by the specific AlMn ratio.  It generally lies between the melting points of pure aluminum (660°C) and pure manganese (1246°C).  The eutectic point, representing the lowest melting point for a given composition, needs to be considered for optimal processing.

-Mechanical Properties:  The mechanical properties, including tensile strength, yield strength, elongation, and hardness, are significantly influenced by the manganese content and the heat treatment applied during manufacturing.  Higher manganese percentages generally lead to increased strength and hardness but can reduce ductility.  Typical ranges for tensile strength are 200-400 MPa, with hardness varying from 40 to 80 HB (Brinell hardness).  Specific values depend heavily on the alloy composition and processing parameters.

-Electrical Conductivity:  The electrical conductivity of AlMn alloys is generally lower than pure aluminum but still remains relatively high, making them suitable for applications requiring good electrical conductivity.  The precise conductivity is dependent on the alloy's composition and the presence of impurities.

-Corrosion Resistance: AlMn alloys exhibit improved corrosion resistance compared to pure aluminum due to the formation of a protective oxide layer.  The corrosion resistance can be further enhanced through surface treatments like anodization.  The level of corrosion resistance is influenced by the environment and the alloy's composition.

### Manufacturing Processes

The manufacturing process of AlMn alloy targets involves several steps:

1. Alloying:  Precise quantities of aluminum and manganese are melted together under controlled conditions to achieve the desired composition.  This step requires careful control of temperature and atmosphere to prevent oxidation and ensure homogeneity.

2. Casting: The molten alloy is cast into the desired shape, typically a circular disk or rectangular plate, using techniques like vacuum induction melting or investment casting.

3. Machining: The cast target is then machined to precise dimensions and surface finish, depending on the application requirements.  This step may involve processes like milling, turning, and grinding.

4. Heat Treatment: Heat treatment is often employed to optimize the mechanical properties of the target.  Different heat treatments can be used to achieve specific combinations of strength, hardness, and ductility.

5. Surface Finishing:  Final surface treatments, such as polishing or etching, may be applied to improve the surface quality and ensure optimal deposition performance.

### Applications

1. Semiconductor Industry:

    -PVD Targets: AlMn alloy targets are widely used in PVD processes to deposit thin films with high electrical conductivity and good adhesion.  These films are crucial for interconnects, contacts, and other components in integrated circuits.  Specific applications include creating diffusion barriers, reducing contact resistance, and improving thermal conductivity.

    -Packaging:  AlMn alloys are used in packaging applications due to their ability to form reliable electrical connections and provide good thermal dissipation.

    -Thermal Management:  The high thermal conductivity of AlMn alloys makes them suitable for heat sink applications in microelectronic devices, enhancing their reliability and performance.  Specific examples include heat spreaders for high-power transistors and chip-level thermal management solutions.  Quantifiable improvements in thermal resistance can be demonstrated through testing.

2. Aerospace: AlMn alloys are used in lightweight structural components due to their high strength-to-weight ratio.  Specific examples include aircraft parts, satellite components, and rocket nozzles.  The use of AlMn alloys results in weight savings, leading to fuel efficiency improvements.

3. Automotive:  Similar to aerospace applications, AlMn alloys are used in automotive parts to reduce weight and improve fuel economy.  Examples include engine components, body panels, and chassis parts.

4. Other Applications:  These alloys find applications in various other fields, including decorative coatings, medical implants, and consumer electronics.

To receive a prompt quotation and expedited delivery, please provide complete target material specifications. This includes details on purity, dimensions, tolerance requirements, and any other technical specifications.

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AlMn Sputtering Target.jpg

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