Element Symbol: FeCoSiB
CAS: [N/A]
Model: Sup-FeCoSiB
Purity: 4N, 3N5,3N, 2N8,2N5
Shape: Round
Thickness: [N/A]
Dimension: [N/A]
(Note: Purity, shape, thickness, and dimensions can all be customized)
Iron-cobalt-silicon-boron targets (FeCoSiB Target) are alloy sputtering targets primarily composed of iron (Fe), cobalt (Co), silicon (Si), and boron (B). These targets are widely used in physical vapor deposition (PVD) and other thin film deposition techniques, especially in the manufacturing of magnetic materials and electronic devices.
Note: Purity, shape, thickness, and dimensions can all be customized,Please feel free to contact us for more details.
### Physical and Chemical Properties
- Iron (Fe): Provides good magnetic properties and electrical conductivity, commonly used in magnetic film production.
- Cobalt (Co): Enhances the material's magnetic properties and thermal stability, improving oxidation resistance.
- Silicon (Si): Improves the plasticity and strength of the material, particularly at high temperatures.
- Boron (B): Increases hardness and wear resistance, while also enhancing oxidation resistance.
### Application Areas
1. Magnetic Materials
Iron-cobalt-silicon-boron targets are often used to produce high-performance magnetic materials, suitable for various applications such as magnetic heads, sensors, and storage devices.
2. Microelectronic Devices
In the microelectronics field, these targets are utilized for thin film deposition, enhancing the performance and stability of devices.
3. Sensor Technology
Due to their excellent magnetic and electrical properties, iron-cobalt-silicon-boron targets are widely applied in sensor manufacturing, particularly in magnetic sensors and micro-electromechanical systems (MEMS).
To receive a prompt quotation and expedited delivery, please provide complete target material specifications. This includes details on purity, dimensions, tolerance requirements, and any other technical specifications.
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