High Purity Niobium Nb Sputtering Target Customized

Nb Target Product Details

Niobium targets are sputtering targets made of pure niobium metal, primarily used in thin-film deposition processes, especially physical vapor deposition (PVD) and sputtering.  Niobium's high melting point, excellent electrical conductivity, good corrosion resistance, and superconductivity make it a crucial material for thin-film applications in semiconductors, superconductor devices, and other high-tech fields. The purity and dimensions of niobium targets can be customized to meet specific application requirements.

Note: Purity, shape, thickness, and dimensions can all be customized,Please feel free to contact us for more details.

Nb Target Physical and Chemical Properties

-Composition: Pure niobium (Nb), with potentially trace impurities depending on the target's purity grade.

-Density: Approximately 8.57 g/cm³

-Melting Point: Approximately 2468 °C

-Boiling Point: Approximately 4744 °C

-Electrical Conductivity: Excellent electrical conductivity.

-Corrosion Resistance: Good corrosion resistance, particularly in many acidic environments.

-Hardness: Moderate hardness.

-Superconductivity: Exhibits superconductivity at low temperatures.

Applications of Nb Target

-Semiconductor Manufacturing: Used in the fabrication of thin films for high-performance semiconductor devices, such as electrodes and interconnect layers.

-Superconducting Devices: A key material for the fabrication of superconducting films and devices.

-Optical Devices: Used in the fabrication of thin films with specific optical properties.

-MEMS Devices: Used in the manufacturing of precise structures in microelectromechanical systems (MEMS).

-Other Applications: Also finds applications in specialized coatings and materials science research.

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