Element Symbol:Aluminum Silicon (AlSi)
CAS:[N/A]
Model:Sup-AlSi
Purity:4N, 3N5,3N
Shape:Round
Thickness:[N/A]
Dimension:[N/A]
(Note: Purity, shape, thickness, and dimensions can all be customized)
Aluminum-silicon alloy targets are alloy sputtering targets composed of aluminum (Al) and silicon (Si), primarily used in thin-film deposition processes, especially physical vapor deposition (PVD) and sputtering. They combine the excellent conductivity of aluminum with the semiconductor properties and thermal stability of silicon, making them a crucial material for thin-film applications in the semiconductor and related industries. The aluminum-to-silicon ratio can be adjusted to optimize performance for specific applications.
Note: Purity, shape, thickness, and dimensions can all be customized,Please feel free to contact us for more details.
Purity (%) | Shape | Manufacturing process | Max. Size |
99.9%, 99.95%, 99.7% | Plane target, Cylindrical target, Arc target, Custom-shaped target | Vacuum Melting,PM | Customized |
To receive a prompt quotation and expedited delivery, please provide complete target material specifications. This includes details on purity, dimensions, tolerance requirements, and any other technical specifications.
Main Characteristics
- Composition: The aluminum-silicon ratio in aluminum-silicon alloy targets is variable, typically with a higher aluminum content.
- Density: Density varies depending on the aluminum-silicon ratio, generally ranging from 2.7 to 2.9 g/cm³, slightly lower than pure aluminum.
- Melting Point: The melting point is lower than that of pure aluminum (660°C), with the exact value depending on the alloy composition.
- Electrical Conductivity: Exhibits good electrical conductivity, although lower than pure aluminum.
- Thermal Stability: Possesses good thermal stability, capable of withstanding high-temperature processes.
- Hardness: Slightly harder than pure aluminum.
- Corrosion Resistance: Corrosion resistance depends on the alloy composition and environment, generally slightly better than pure aluminum.
Main Applications of Titanium sputtering targets
- Semiconductor Manufacturing: Widely used in integrated circuit interconnect layers to improve conductivity and reliability. Also used in contact layers to ensure good electrical connection.
- Packaging Materials: Used as lead frames or other packaging materials in semiconductor packaging.
- Optoelectronic Devices: Used as electrode materials or functional layers in some optoelectronic devices.
- Other Applications: Also finds applications in specialized coatings and materials science research.
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Contact: Bruce Liu
WhatsApp: +86-18059149998
Tel: +86-18059149998
Email: sales@supsemi.com
Add: Room 1402, Building 1, No. 89 Xibeilu, Xishancun, Xibei Street, Xinluo District, Longyan City, Fujian Province
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