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Semi-cabinet Semiconductor Wafer Cleaning Machine Equipment

Product Name:Semi-cabinet Semiconductor Wafer Scrubber Machine

Product Model:SUP-VTC-200-CE

Description:The SUP-VTC-200-CE semi-cabinet cleaning machine uses linear guide rails to control the columnar liquid flow, sweeping back and forth along the radius of the wafer. It is equipped with deionized water cleaning and nitrogen drying functions, and utilizes a high-precision servo motor to control the rotation of the wafer.

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Product Description

The SUP-VTC-200-CE semi-cabinet cleaning machine uses linear guide rails to control the columnar liquid flow, sweeping back and forth along the radius of the wafer. It is equipped with deionized water cleaning and nitrogen drying functions, and utilizes a high-precision servo motor to control the rotation of the wafer. The operation is managed via a seven-inch full-color touchscreen. The machine features a fully stainless steel cabinet, a corrosion-resistant transparent observation cover, and a screw rod linear guide. 

Its stainless steel interior is designed for durability and longevity. The servo motor controls the rotation speed and time, automatically managing the development, cleaning, and drying processes, ensuring good uniformity and repeatability in both development and cleaning.


Product Features

1. Stainless steel semi-cabinet design with touchscreen operation

2. Transparent observation window with waste drainage and ventilation functions

3. Movable linear guide cleaning system with customizable stroke

4. Optionally equipped with four-channel cleaning or nitrogen drying system

5. Capable of handling substrates up to 8-inch wafers, with downward compatibility

6. Larger sizes available upon customization


Product Parameters

Product NameSemi-cabinet Semiconductor Wafer Cleaning Machine Equipment 
Product Model
SUP-VTC-200-CE
Parameters

1. Adjustable rotation speed range: 20-10,000 rpm

2. Adjustable acceleration range: 0-50,000 rpm/s

3. Standard linear guide travel: 100 mm; maximum speed: 100 mm/s

4. Standard dual-liquid spraying system, with optional fan-shaped or column-shaped nozzles

5. Comes standard with two 10L stainless steel pressure tanks; other specifications available upon request

6.Optional cleaning liquid or nitrogen heating system


Specifications

Dimensions: 940 mm (L) × 800 mm (W) × 1100 mm (H)

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