Magnetron Sputtering System for Thin Film Deposition and SEM Sample Preparation

Magnetron Sputtering System for Thin Film Deposition and SEM Sample Preparation

Product Name: Magnetron Sputtering System for Thin Film Deposition and SEM Sample Preparation

Product Model: GSL-1100X-SPC-16M

Product Description: The GSL-1100X-SPC-16M magnetron sputtering system utilizes the sputtering effect generated by particle bombardment of the target material in a vacuum environment, causing atoms or molecules to be ejected from the solid surface and deposited onto a substrate to form a thin film. This process is a type of physical vapor deposition (PVD) technology for thin film preparation.

Product Description

The system is designed to be a simple, reliable, and economical coating device, suitable for preparing various composite film samples in the laboratory, as well as for fabricating experimental electrodes made of non-conductive materials.

The GSL-1100X-SPC-16M Magnetron Sputtering System can be used for preparing scanning electron microscope (SEM) samples, and its compact design saves laboratory space. It is easy to operate, making it ideal for beginners.

Product Features

1. Equipped with a vacuum gauge and sputtering current meter for real-time monitoring of operating status.

2. Controls vacuum chamber pressure, ionization current, and selects the required ionization gas by adjusting the sputtering current controller and micro vacuum valve to achieve optimal coating conditions.

3. The rubber sealing ring at the edge of the bell jar is specially designed to prevent chipping of the glass bell jar during prolonged use.

4. The ceramic-sealed high-voltage electrode connector is more durable than the commonly used rubber seal.

5. A large-capacity sputtering vacuum chamber and corresponding target area are used based on the gas ionization characteristics in the electric field, ensuring a more uniform and pure sputtered coating.

6. The sputtering head uses Peltier cooling technology to achieve high-performance, fine particle coatings.

7. Water-cooled sputtering head and water-cooled sample stage are available.

Product Parameters

Product Name

Magnetron Sputtering System for Thin Film Deposition and SEM Sample Preparation

Product Model

GSL-1100X-SPC-16M

Installation

Requirements

This equipment must be used under the following conditions: temperature 25°C ± 15°C and humidity 55% RH ± 10% RH.

1. Water: The equipment requires a self-circulating cooling water system (use purified water or deionized water).

2. Electricity: AC 220V, 50Hz, with proper grounding required.

3. Gas: The chamber needs to be filled with argon gas (purity above 99.99%); an argon gas cylinder (with pressure regulator) must be provided by the user.

4. Work Surface: Dimensions 600mm × 600mm × 700mm, with a load capacity of over 50kg.

5. Ventilation: Not required.

Main

Parameters

1. Target: Ø50mm

2. Vacuum Chamber: Ø160mm × 120mm

3. Vacuum Level: ≤4 × 10^-2 mbar

4. Max Current: 50mA (optional 100mA)

5. Settable Time Limit: 9999s

6. Micro Vacuum Valve: Connects to Ø3mm soft hose

7. Maximum Voltage: 1600V DC

8. Mechanical Pump: 2L/s