Triple-Target Magnetron Sputtering System for Lab Thin Film

Triple-Target Magnetron Sputtering System for Lab Thin Film

Product Name: Triple-Target Magnetron Sputtering System for Lab Thin Film

Product Model: VTC-600-3HD

Product Description: The VTC-600-3HD triple-target magnetron sputtering system is a newly developed coating device that can be used to prepare single-layer or multi-layer films, including ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, and polytetrafluoroethylene (PTFE) films.

Product Description

The VTC-600-3HD triple-target Magnetron Sputtering System is equipped with three target guns: one paired with an RF power supply for sputtering non-conductive targets, and two paired with DC power supplies for sputtering conductive materials. Compared to similar equipment, it not only has a wide range of applications but also features a compact size for ease of operation. It is an ideal device for laboratory preparation of material films, particularly suitable for research on solid-state electrolytes and OLEDs.

Product Features

1. Equipped with three target guns: one paired with an RF power supply for sputtering non-conductive targets, and two paired with DC power supplies for sputtering conductive materials (the target guns can be swapped as needed by the customer).

2. Capable of preparing various films with a wide range of applications.

3. Compact size and easy to operate.

4. Modular design of the entire system, with a separate vacuum chamber, vacuum pump group, and control power supply, allowing for adjustments based on user requirements.

5. Users can choose the power supply according to their actual needs; one power supply can control multiple target guns, or multiple power supplies can individually control a single target gun.

Product Parameters

Product Name

Triple-Target Magnetron Sputtering System for Lab Thin Film

Product Model

VTC-600-3HD

Installation

Requirements

This equipment is required to operate at a temperature of 25°C ± 15°C and a humidity of 55% RH ± 10% RH.

1. Water: The equipment is equipped with a self-circulating cooling water system (fill with purified water or deionized water).

2. Power: AC 220V 50Hz (110V opptional), must have good grounding.

3. Gas: The equipment chamber must be filled with argon gas (purity of 99.99% or higher); an argon gas cylinder (with a Ø6 mm double ferrule connector) and pressure regulator must be provided by the user.

4. Workbench: Dimensions 1500 mm × 600 mm × 700 mm, with a load capacity of over 200 kg.

5. Ventilation: Required.

Main

Parameters

1. Power supply voltage: 220V 50Hz

2. Total power: < 2.5 kW

3. Chamber inner diameter: Ø300 mm

4. Ultimate vacuum level: < E-6 mbar

5. Operating temperature: RT - 500°C, accuracy ±1°C (temperature can be increased based on actual needs)

6. Number of target guns: 3

7. Target gun cooling method: Water cooling

8. Target material size: Ø2″, thickness 0.1 mm - 5 mm (thickness may vary depending on the target material)

9. DC sputtering power: 500W (optional)

10. RF sputtering power: 300W/500W (optional)

11. Sample stage: Ø140 mm, with optional bias function available based on customer needs for higher quality coating.

12. Sample stage rotation speed: Adjustable within 1 rpm - 20 rpm

13. Protective gases: Inert gases such as Ar, N2

14. Inlet gas line: Mass flow meter controls two gas inlets, one at 100 SCCM and the other at 200 SCCM.

Product

specifications

1. Main unit dimensions: 500 mm × 560 mm × 660 mm

2. Overall dimensions: 1300 mm × 660 mm × 1200 mm

3. Weight: 160 kg

Standard Accessories

Item No.	Product Name	Qty
1	DC Power Supply Control System	2 set
2	RF Power Supply Control System	1 set
3	Film Thickness Monitoring System	1 set
4	Molecular Pump (imported from Germany or domestic with greater pumping speed)	1 unit
5	Chiller	1 unit
6	Polyester PU Tube (Ø6 mm)	4m

Optional Accessories

Item No.	Product Name	Qty
1	Various target materials such as gold, indium, silver, and platinum	Optional
2	Optional strong magnetic target for sputtering ferromagnetic materials	Optional
3	Double-layer rotating coating fixture	Optional
4	Mask Plate	Optional
5	Vibration Sample Stage	Optional