Single Target Magnetron Sputtering System for Lab Thin Film

Product Name: Single Target Magnetron Sputtering System for Lab Thin Film

Product Model: VTC-600-1HD

Product Description: The VTC-600-1HD single-target magnetron sputtering system is a high-vacuum coating device independently developed by our company.
It can be used to prepare single-layer or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, and polytetrafluoroethylene films, among others.

Product Description

The VTC-600-1HD dual-target Magnetron Sputtering System is equipped with a target gun that allows for the selection of either a strong magnetic target or a weak magnetic target. The weak magnetic target is used for sputtering non-magnetic materials, while the strong magnetic target is used for sputtering ferromagnetic materials.

Compared to similar devices, it is compact for easy operation and has a wide range of usable materials, making it an ideal device for laboratory preparation of various types of thin films.

Product Features

1. You can choose a target gun, equipped with a radio frequency power supply for sputtering non-conductive target materials or a direct current power supply for sputtering conductive materials.

2. It can prepare various thin films and has wide applications.

3. It has a compact size and is easy to operate.

Product Parameters

Product Name

Single Target Magnetron Sputtering System for Lab Thin Film

Product Model

VTC-600-1HD

Installation

Requirements

This equipment is required to be used at a temperature of 25°C ± 15°C and a humidity of 55% RH ± 10% RH.

Water: The device is equipped with a self-circulating cooling water machine (fill with purified water or deionized water).

Electricity: AC 220V, 50Hz, with proper grounding required.

Gas: The equipment chamber must be filled with argon gas (purity of 99.99% or above). An arg on gas cylinder (with a Ø6mm double ferrule connector) and a pressure regulator must be provided.

Worktable: Dimensions of 1500mm × 600mm × 700mm, with a load capacity of over 200kg.

Ventilation: A ventilation system is required.

Main

Parameters

1. Power Supply Voltage: 220V, 50Hz

2. Power: <1KW (excluding vacuum pump)

3. Chamber Inner Diameter: Ø300mm

4. Ultimate Vacuum: 9.0 × 10⁻⁴ Pa

5. Sample Stage Heating Temperature: RT - 500°C, accuracy ±1°C (temperature can be increase d as needed)

6. Number of Target Guns: 1 (additional guns can be customized)

7. Target Gun Cooling Method: Water cooling

8. Target Material Size: Ø2″, thickness 0.1-5mm (thickness may vary with different materials)

9. DC Sputtering Power: 500W; RF Sputtering Power: 300W (target power supply type is selecta ble: DC or RF)

10. Sample Stage: Ø140mm, can be equipped with a bias function based on customer requirements for higher quality coatings.

11. Sample Stage Rotation Speed: Adjustable between 1rpm - 20rpm

12. Working Gas: Inert gases such as Ar

13. Gas Inlet Lines: Mass flow meter controls two gas inlets, one at 100 SCCM and the other at 200 SCCM.

Product

specifications

Host dimensions: 500mm × 560mm × 660mm

Overall dimensions: 1300mm × 660mm × 1200mm

Weight: 160kg

Vacuum chamber specifications: φ300 × 300mm

Standard Accessories

Item No.	Product Name	Qty
1	DC Power Supply Control System	1 set
2	RF Power Supply Control System	1 set
3	Chiller	1 set
4	Polyester PU Tube (Ø6 mm)	4m

Optional Accessories

Item No.	Product Name	Qty
1	Various target materials such as gold, indium, silver, and platinum	Optional
2	Optional strong magnetic target for sputtering ferromagnetic materials	Optional
3	Film thickness monitoring system	Optional
4	Molecular pump (imported from Germany or domestic with higher pumping speed)	Optional