Plasma Triple-Target Sputtering System: Three-Target Sputter Coating Solution for Laboratory Applications

Product Name: Small Lab Triple-Target Plasma Sputter Coater for Thin Film

Product Model: SUP-1100X-SPC-16-3

Product Description: The SUP-1100X-SPC-16-3 plasma triple-target sputtering system is designed based on the principle of direct current (DC) sputtering. DC sputter deposition refers to the process in which particles bombard the target material in a vacuum environment, generating a sputtering effect that ejects atoms or molecules from the solid surface of the target, which then deposit on the substrate to form a thin film.

This technology is a type of physical vapor deposition (PVD) for film preparation, providing a simple, reliable, and economical coating solution.

Product Description

The SUP-1100X-SPC-16-3 plasma triple-target sputtering system is unique in that it installs three targets within a single vacuum chamber. The rotating sample stage allows for the sequential deposition of three different materials onto the same sample. This makes it suitable for the preparation of various composite film samples in the laboratory, as well as for the fabrication of experimental electrodes from non-conductive materials.

The device is compact, saves laboratory space, and is easy to operate, making it particularly well-suited for laboratory use.

Product Features

1. Equipped with a vacuum gauge and a sputtering current meter for real-time monitoring of the operating status.

2. By adjusting the sputtering current controller and the micro vacuum valve, the pressure in the vacuum chamber, ionization current, and the choice of ionization gas can be controlled to achieve optimal coating results.

3. The rubber sealing ring at the edge of the bell jar is specially designed to prevent "chipping" of the glass bell jar even after prolonged use.

4. The ceramic-sealed high-pressure electrode connector is more durable than the commonly used rubber seals.

5. Based on the gas ionization characteristics in the electric field, a large-capacity sputtering vacuum chamber and appropriately sized sputtering targets are employed to ensure a more uniform and pure sputtered coating.

6. The system has also been CE certified.

Product Parameters

Product Name	Plasma Triple-Target Sputtering System Three Targets Sputter Coating System for thin film
Product Model	SUP-1100X-SPC-16
Installation Requirements	This equipment is required to operate at a temperature of 25°C ± 15°C and a humidity of 55% RH ± 10% RH. 1. Water: Not required 2. Power: AC 220V 50Hz, must have good grounding 3. Gas: The equipment chamber must be filled with argon gas (purity of 99.99% or higher); an argon gas cylinder (with pressure regulator) must be provided by the user 4. Workbench: Dimensions 600 mm × 600 mm × 700 mm, with a load capacity of over 50 kg 5. Ventilation: Not required
Main Parameters	1. Target: Ø45 mm 2. Vacuum chamber: Ø160 mm × 120 mm 3. Maximum vacuum level: ≤4 × 10⁻² mbar 4. Number of targets: 3 5. Maximum current: 50 mA 6. Maximum settable time: 900 s 7. Micro vacuum valve: Connects to Ø3 mm soft hose 8. Maximum voltage: 1600V DC 9. Mechanical pump: 2 L/s
Product specifications	dimensions：400mm×300mm×400mm Weight：30kg

Standard Accessories

Item No.	Product Name	Qty
1	Gold Target Material	1
2	Copper Target Material	1
3	Aluminum Target Material	1
4	Inlet Needle Valve	1
5	Fuse	2