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Product Name: Small Dual-Target Magnetron Sputtering System for Laboratory Thin Film Applications
Product Model: SUP-600-2HD-1000
Product Description: The SUP-600-2HD-1000 dual-target magnetron sputtering system is a high-vacuum coating device independently developed by our company.
It can be used to prepare single-layer or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, and polytetrafluoroethylene films, among others.
Product Description
The VTC-600-2HD-1000 dual-target Magnetron Sputtering System is equipped with two target guns and two power supplies: one radio frequency power supply for sputtering non-conductive materials and one direct current power supply for sputtering conductive materials. An optional strong magnetic target is available for sputtering ferromagnetic materials.
Compared to similar devices, it is compact and easy to operate, with a wide range of usable materials, making it an ideal device for laboratory preparation of various types of thin films.
Product Features
1. Configured with two target guns: one paired with a radio frequency power supply for sputtering non-conductive target materials, and the other with a direct current power supply for sputtering conductive materials.
2. Capable of preparing various thin films with wide applications.
3. Compact size and easy to operate.
Product Parameters
| Product Name | Small Dual-Target Magnetron Sputtering System for Laboratory Thin Film Applications |
| Product Model | SUP-600-2HD-1000 |
Installation Requirements | This equipment is required to be used at a temperature of 25°C ± 15°C and a humidity of 55% RH ± 10% RH. 1. Water: The device is equipped with a self-circulating cooling water machine (fill with purified water or deionized water). 2. Electricity: AC 220V, 50Hz, with proper grounding required. 3. Gas: The equipment chamber must be filled with argon gas (purity of 99.99% or above). An argon gas cylinder (with a Ø6mm double ferrule connector) and a pressure regulator must be provided. 4. Worktable: Dimensions of 1500mm × 600mm × 700mm, with a load capacity of over 200kg. 5. Ventilation: A ventilation system is required. |
Main Parameters | 1. Input power supply: 220V/50Hz 2. Number of sputtering targets: 2 3. Chamber inner diameter: Ø300mm 4. Target gun cooling method: Water cooling 5. Ultimate vacuum: 7.4E-5 Pa 6. Vacuum chamber specifications: Φ300 × 330 mm 7. Vacuum system: VRD-16 mechanical pump, FF-100/150 turbo molecular pump 8. Vacuum recovery: System can be evacuated from atmospheric pressure to 5.0E-3 Pa in ≤30 min (short-term exposure to atmosphere) 9. Gas charging system: 2 mass flow meters (1 for argon at 100 sccm, 2 for argon at 200 sccm); special gases can be customized 10. Sputtering target specifications: Φ2", thickness 0.1-5mm (thickness may vary with different materials) 11. Sample stage: Φ140mm / rotatable (1–20 rpm) / can be heated (room temperature to 1000℃) |
Product specifications | Host dimensions: Width 900mm × Depth 650mm × Height 1100mm |
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Contact: Bruce Liu
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Tel: +86-18059149998
Email: sales@supsemi.com
Add: Room 1402, Building 1, No. 89 Xibeilu, Xishancun, Xibei Street, Xinluo District, Longyan City, Fujian Province
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