PECVD Tube Furnace System 1200C with Vacuum Pump 4 Channels Gas Delivery to Deposit Thin Films or Grow Nanowire

Product Model: OTF-1200X-PEC4LV

Product Description: OTF-1200X-PEC4LV is acompact PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system, which consists of 300W RF plasma source, 2" or 3.14" O.D optional split tube furnace, 4 channels precision mass flow meter with gas mixing tank, and high-quality mechanical pump.

Product Description

The PE CVD Furnace is an ideal and affordable tool to deposit thin films or grow nanowire from a gas state (vapor) to a solid-state, and benefits:

• Lower temperature processing compared to conventional CVD.

• Film stress can be controlled by high/low frequency mixing techniques.

• Control over stoichiometry via process conditions.

• Offers a wide range of material deposition, including SiOx, SiNx, SiOxNy and Amorphous silicon (a-Si:H) deposition.

Product Parameters

Split Tube Furnace

• 1200°C Max. working temperature for < 60 minutes

• 1100°C Max for continuous heating

• 30 segments programmable precision digital temperature controller

• 440 mm length single heating zone and 150 mm length constant temperate zone

• High purity quartz tube optional from

• One pair of the vacuum-sealed flange with valves

- 2"OD x 1.7"ID x 48" Length

- 3.14"OD x 2.83"ID x 48'' Length

• Input power: 208 – 240V AC input, a single phase at max. 4KW

Plasma RF Power Supply

• Output Power: 5 -300W adjustable with ± 1% stability

• RF frequency: 13.56 MHz ±0.005% stability

• Reflection Power: 200W max.

• Matching: Automatic

• RF Output Port: 50 Ω, N-type, female

• Noise: <50 dB.

• Cooling: Air cooling.

• Power: 208-240VAC, 50/60Hz

• Note: This RF power supply can accept 50 - 80 mm Max. quartz tube by changing flange

Plasma RF Power Supply.jpeg Plasma RF Power Supply.jpg

Anti-corrosive Pressure

Gauge

• 3.8x10-5 to 1125 Torr measurement range

• Anti-corrosive, gas-type independent

• High accuracy and reproducibility at atmosphere for reliable atmospheric pressure detection

• Fast atmospheric detection eliminates waiting time and shortens the process cycle

• Easy to exchange plug & play sensor element

Vacuum Pump and valve

• Heavy-Duty Rotary Vane Vacuum Pump (7.8 CFM -240 L/m) with Two-Stage Exhaust System installed in the bottom case with max. vacuum pressure 10-2 torr.

• KFD25 adapter and stainless steel pipe are connected between pump and tube flange with precision ball valve

• Digital vacuum pressure gauge and display are installed with the furnace

Vacuum Pump and valve.png

Mass Flowmeter

• 4-channeled Gas Mixing

• Made of 316 stainless steel valve

• Gas mixing tank: Φ80X120mm

• 600mm(L) x 745mm(W) x 700mm(H)

• 6" color touch screen control panel to make parameter setting at easy.

• Touchscreen Control and PC remote switchable.

• 23W per channel

• AC 220V/50Hz Single phase

Compliance

• CE Certified

• NRTL or CSA certification is available upon request at extra cost.

Temperature Control

• MET certified 30 programmable segments for precise control of heating rate, cooling rate and dwell time.

• Built-in PID Auto-Tune function with overheating & broken thermocouple protection.

• Over-temperature protection and alarm allow for operation without attendant(s).

• +/- 1 ºC temperature accuracy.

• RS485 Communications Port.

Temperature Control.jpeg

Dimensions

Dimensions:

• Furnace: 550mm(L) x 380mm(W) x 520mm(H)

• 3 Bottom Mobile case together: 1800mm(L) x 850mm(W) x 700mm(H)

Warranty

One-year limited manufacturer's warranty (Consumable parts such as processing tubes, O-rings and heating elements are not covered by the warranty, please order replacements at related products below).

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