Compact Plasma Cleaner Cleaning Machine Surface Treatment Equipment

Product Description:

The SUP-PCE-6 small Plasma Cleaner features a quartz chamber with dimensions Ø160mm × 190mm, utilizing a 3.0MHz RF power supply with adjustable output power levels of 7.2W, 10.2W, and 29.6W. This machine primarily removes oxide layers and contaminants from substrates using plasma generated from gases such as air, oxygen, or argon. It can also alter the surface properties of objects (such as hydrophilicity and hydrophobicity), making it an ideal device for substrate cleaning and film treatment.

The compact size of the SUP-PCE-6 small Plasma Cleaner saves valuable laboratory space. It is equipped with a dual rotary vacuum pump that evacuates the chamber while introducing gases like argon, making it suitable for cleaning items that are prone to oxidation.

Product Features:

1. The control panel's buttons and switches allow for adjustments to the RF power, the operation of the vacuum pump, and the cleaning time. 

2. Information such as time, power, and vacuum level is displayed on a set of four-digit digital tubes.

3. A three-way valve is installed to accurately control the gas flow rate and to clean the chamber with atmospheric flow. The gas inlet interface is a 6mm push-fit connection.

4. By selecting a high-power RF power supply, plasma etching and plasma ashing experiments can be conducted.

Product Parameters:

Optional Accessories:

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