Sputter Evaporation Coating System with Thermal Evaporation Accessory - Dual Function for Metal and Carbon Film Deposition

Sputter Evaporation Coating System with Thermal Evaporation Accessory - Dual Function for Metal and Carbon Film Deposition

Product Name: Compact Lab Sputtering and Evaporation Coating System with Thermal Evaporation Accessory

Product Model: SUP-1100X-SPC-16C

Product Description: The SUP-1100X-SPC-16C sputter evaporation coating system is equipped with a thermal evaporation accessory, offering both sputtering and evaporation functions. It can deposit metal films using plasma sputtering, as well as obtain thin films of carbon or other pure metals through evaporation.

Product Description

The SUP-1100X-SPC-16C sputter evaporation coating system is capable of gold sputtering, gold evaporation, or carbon evaporation for scanning electron microscope (SEM) sample surfaces, as well as fabricating experimental electrodes for non-conductive materials. It can also be used for various experiments on the properties of new materials in material research.

The compact design saves laboratory space, and its simple operation and easy cleaning make it suitable for beginners. It is especially ideal for use in university laboratories, research institutions, and corporate labs. Equipped with a thermal evaporation accessory, it can evaporate carbon wires or other materials such as aluminum and stainless steel, while offering both sputtering and evaporation functions. This expands its application range, particularly for gold sputtering or evaporation and carbon evaporation on SEM sample surfaces.

Product Parameters

Product Name

Compact Lab Sputtering and Evaporation Coating System with Thermal Evaporation Accessory

Product Model

SUP-1100X-SPC-16C

Installation

Requirements

This equipment must be used under the following conditions: temperature 25°C ± 15°C and humidity 55% RH ± 10% RH.

1. Water: Not required

2. Electricity: AC 220V, 50Hz, with proper grounding required

3. Gas: The chamber needs to be filled with argon gas (purity above 99.99%); an argon gas cylinder with a pressure regulator must be provided by the user

4. Work Surface: Dimensions 600mm × 600mm × 700mm, with a load capacity of over 50kg

5. Ventilation: Not required

Main

Parameters

1. Target: Ø50mm

2. Sample Stage: Ø50mm

3. Vacuum Chamber: Ø160mm × 110mm

4. Vacuum Level: 4 × 10^-1 mbar to 2 × 10^-2 mbar

5. Maximum Current: 50mA

6. Settable Time Limit: 9999s

7. Maximum Voltage: 1600V, adjustable DC

8. Vacuum Pump: 4L two-stage mechanical rotary pump, with an ultimate vacuum of 2 × 10^-2 mbar (optional domestic molecular pump available)