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Aluminum Titanium AlTi Sputtering Targets Customized

Element Symbol:Aluminum Titanium (AlTi)
CAS:[N/A]
Model:Sup-AlTi
Purity:4N, 3N5, 3N
Shape:Round
Thickness:[N/A]
Dimension:[N/A]
(Note: Purity, shape, thickness, and dimensions can all be customized)

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Titanium-aluminum targets are alloy materials made from titanium (Ti) and aluminum (Al), widely used in thin-film deposition technologies, particularly in Physical Vapor Deposition (PVD) and sputtering processes. Due to their excellent physical and chemical properties, titanium-aluminum targets find extensive applications in the semiconductor, optoelectronic, and other high-tech industries.

Note: Purity, shape, thickness, and dimensions can all be customized,Please feel free to contact us for more details.


Ti-75Al at%Ti-70Al at%Ti-67Al at%Ti-60Al at%Ti-50Al at%Ti-30Al at%Ti-20Al at%Ti-14Al at%
Purity (%)99.799.799.799.799.8/99.999.999.999.9
Density (g/cm3)3.13.23.33.43.63/3.853.974.254.3
Grain Size (µm)100100100100100/----
ProcessHIPHIPHIPHIPHIP/VARVARVARVAR

To receive a prompt quotation and expedited delivery, please provide complete target material specifications. This includes details on purity, dimensions, tolerance requirements, and any other technical specifications.

Main Characteristics

1. Density: The density of titanium-aluminum targets typically ranges from 3.5 to 4.5 g/cm³, depending on the ratio of titanium to aluminum.

2. Melting Point: The melting point of titanium is approximately 1668°C, while that of aluminum is around 660°C. The melting point of the titanium-aluminum alloy is between these two values.

3. Electrical Conductivity: Titanium-aluminum alloys exhibit good electrical conductivity, making them suitable for use in electronic devices.

4. Corrosion Resistance: Titanium possesses excellent corrosion resistance, allowing it to remain stable in various chemical environments.

5. Strength: Titanium-aluminum alloys have high strength, making them suitable for use in high-temperature and high-pressure environments.

Main Applications of Aluminum sputtering targets

1. Semiconductor Manufacturing: Used in the deposition of integrated circuits and thin-film transistors to enhance device performance.

2. Optoelectronic Devices: Applied in the fabrication of optical films and photodetectors to improve optical performance.

3. Aerospace: Utilized in the aerospace industry for manufacturing lightweight, high-strength components.

4. Medical Devices: Due to their biocompatibility, titanium-aluminum materials are suitable for medical implants.

5. Coating Technology: Used to produce wear-resistant and corrosion-resistant surface coatings, extending the lifespan of products.

Summary

Titanium-aluminum targets, with their excellent overall performance, have become indispensable materials in modern high-tech industries.

AlTi Sputtering Target.jpg

AlTi Sputtering Target.jpg

AlTi Sputtering Target.jpg

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