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Chromium-iron-nickel-copper CrFeNiCu Alloy Targets for thin-film Deposition

Element Symbol:CrFeNiCu
CAS:[N/A]
Model:Sup-CrFeNiCu
Purity:4N,3N5,3N
Shape:Round,Square
Thickness:[N/A]
Dimension:[N/A]
(Note: Purity, shape, thickness, and dimensions can all be customized)

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CrFeNiCu Targets Product Details

Chromium-iron-nickel-copper CrFeNiCu alloy sputtering targets are composed of chromium (Cr), iron (Fe), nickel (Ni), and copper (Cu). They are primarily used in thin-film deposition and materials science research. This alloy combines the excellent properties of its constituent elements, making it valuable in various high-tech applications.

Note: Purity, shape, thickness, and dimensions can all be customized,Please feel free to contact us for more details.

Purity (%)ShapeManufacturing processMax. Size
99.9%,99.95%,99.99%

Plane target, Cylindrical target,

 Arc target, Custom-shaped target

Vacuum Melting,PMCustomized

CrFeNiCu Key Properties:

- Corrosion Resistance: The addition of chromium enhances the alloy's resistance to corrosion, making it suitable for harsh environments.

- Strength and Toughness: The combination of iron and nickel improves the mechanical properties, providing excellent strength and toughness.

- Good Conductivity: The high electrical conductivity of copper ensures outstanding performance in electrical applications.

- Thermal Stability: The alloy maintains good physical properties under high-temperature conditions, suitable for various operating environments.

- Physical-Chemical Properties: The alloy exhibits favorable physical-chemical properties, such as good adhesion and uniformity in thin films, contributing to the stability and reliability of the materials used in various applications.

CrFeNiCu Applications:

- Electronics Industry: Used for fabricating conductive layers and thin films, enhancing the performance of electronic components.

- Materials Science Research: Utilized in the development of new alloys and coating materials.

- Semiconductor Field:

  - Thin-Film Deposition: Chromium-iron-nickel-copper alloy targets perform excellently in thin-film deposition for semiconductor devices, providing reliable performance.

  - Electrode Materials: This alloy can be used to manufacture electrodes, improving the conductivity and stability of devices.

Chromium-iron-nickel-copper alloy targets play a significant role in multiple high-tech fields due to their exceptional properties and multifunctionality.


CrFeNiCu alloy Sputtering target.jpgCrFeNiCu alloy Sputtering target.jpg





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