Element Symbol:TiNiZr
CAS:[N/A]
Model:Sup-TiNiZr
Purity:3N5,3N
Shape:Round,Square
Thickness:[N/A]
Dimension:[N/A]
(Note: Purity, shape, thickness, and dimensions can all be customized)
Titanium Niobium Zirconium Alloy Target Product Overview
The Titanium Niobium Zirconium alloy target is a high-performance target made from titanium, niobium, and zirconium. It is widely used in Physical Vapor Deposition (PVD) technology. This alloy combines the strength of titanium, the excellent electrical conductivity of niobium, and the corrosion resistance of zirconium, making it particularly suitable for high-performance electronic devices and thin film deposition.
Note: Purity, shape, thickness, and dimensions can all be customized,Please feel free to contact us for more details.
Purity (%) | Shape | Manufacturing process | Max. Size |
99.95%, 99.9%, 99.5% | Plane target, Cylindrical target, Arc target, Custom-shaped target | Vacuum Melting,PM | Customized |
To receive a prompt quotation and expedited delivery, please provide complete target material specifications. This includes details on purity, dimensions, tolerance requirements, and any other technical specifications.
Physical and Chemical Properties
- Density: The density of the titanium niobium zirconium alloy falls between that of titanium (approximately 4.5 g/cm³) and niobium (approximately 8.57 g/cm³), with the specific value depending on the composition ratio.
- Melting Point: The melting point is typically higher than that of niobium (2468 °C), but it can vary based on composition, and the exact melting point needs to be determined experimentally.
- Hardness: This alloy exhibits high hardness, superior to that of pure titanium and niobium, making it suitable for high-wear environments.
- Electrical Conductivity: The high electrical conductivity of niobium helps enhance the alloy's conductivity.
- Corrosion Resistance: The corrosion resistance of zirconium improves the stability of the alloy in harsh environments, helping to extend its lifespan.
Applications
The titanium niobium zirconium alloy target has various applications in the semiconductor field, including:
1. Thin Film Deposition: Used for producing high-performance conductive films suitable for various electronic and optoelectronic devices.
2. Metal Interconnects: Used as metal interconnect materials in integrated circuits, providing good electrical conductivity and mechanical strength.
3. High-Temperature Applications: Its high melting point and good thermal stability make it suitable for coatings and components in high-temperature environments.
4. Special Applications: Can be designed to meet specific electrical, thermal, or mechanical property requirements as needed.
Summary
The titanium niobium zirconium alloy target, with its exceptional physical and chemical properties, demonstrates broad application potential in the semiconductor and electronics fields. As technology continues to advance, the range of applications for this alloy target is expected to expand further, supporting the development and manufacturing of high-performance materials.
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