Vanadium Boron VB Alloy Sputtering Target

Vanadium-boron VB alloy Sputtering target is composed of vanadium (V) and boron (B), primarily used in thin-film deposition technology. Their excellent properties make them significantly valuable in specific high-tech fields, such as semiconductor manufacturing and wear-resistant coatings.

Note: Purity, shape, thickness, and dimensions can all be customized,Please feel free to contact us for more details.

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Key Features:

- Excellent Mechanical Properties:

  - Vanadium imparts high strength and toughness to the alloy, ensuring stability under high-load conditions. The tensile strength of vanadium can reach up to 900 MPa.

- High Hardness:

  - The addition of boron significantly increases the hardness of the alloy, typically reaching 1500 HV (Vickers hardness), making it suitable for wear-resistant applications.

- Good Electrical Conductivity:

  - The excellent electrical conductivity of vanadium provides potential applications in electronics, with conductivity reaching 6.6 × 10^6 S/m.

- Corrosion Resistance:

  - The alloy exhibits good corrosion resistance in specific environments, especially in chloride and acidic media, prolonging its lifespan.

Applications:

- Thin-Film Deposition:

  - Used in physical vapor deposition (PVD) and chemical vapor deposition (CVD) processes to deposit high-hardness, wear-resistant, or specific conductive films. The deposition rate typically ranges from 1 to 5 nm/s.

- Semiconductor Field:

  - Serves as interconnect materials in specific high-performance devices or for manufacturing specialty functional films. While its application range is relatively limited, its unique properties offer advantages in certain applications.

- Wear-Resistant Coatings:

  - Its high hardness makes it an ideal material for manufacturing wear-resistant coatings, enhancing product durability. In industrial applications, the wear rate can be as low as 0.1 mm/1000 h.

- Materials Science Research:

  - Acts as a crucial experimental material for developing new materials, suitable for exploring new high-performance alloys.

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