High-Performance Vacuum Evaporator for Thin Film Deposition and Metal Coating – PVD System with Thermal Evaporation and Sputter Coater Capabilities Semiconductor

High-Performance Vacuum Evaporator for Thin Film Deposition and Metal Coating – PVD System with Thermal Evaporation and Sputter Coater Capabilities Semiconductor

Brand: SUPSEMI

Product Model: SUP-Z1650

Prodcut Description: SUP-Z1650 is a compact, benchtop evaporator with controllable evaporation power.

Despite its small size, the instrument is fully functional and equipped with voltage and current feedback, a rotating sample stage, height adjustment for the sample, and an electric shutter feature.

Products Details:

The SUP-Z1650 CVD is a compact, benchtop evaporator with controllable evaporation power. Despite its small size, the instrument is fully functional and equipped with voltage and current feedback, a rotating sample stage, height adjustment for the sample, and an electric shutter feature.

By adjusting the preheating and evaporation power on a timer, it is capable of uniformly evaporating and depositing most metals. The vacuum chamber is made of transparent glass, which reduces sample contamination. The rotating sample stage allows for more uniform thin film deposition, enabling the preparation of various metal films and organic films.

Equipment name	Vacuum Deposition Evaporator
Control mode:	7-inch human-machine interface manual automatic mode switching control
Coating function:	0-999 seconds 5-stage adjustable power, baffle position, and sample speed program
Heating method:	digital power regulator
Maximum power:	≤ 1200W
Output voltage and current:	voltage ≤ 12V, current ≤ 120A
Vacuum mechanical pump:	≤ 5Pa (5 minutes) Molecular pump ≤ 5 * 10 ^ -3Pa
Vacuum:	Mechanical pump ≤ 5Pa (5 minutes) Molecular pump ≤ 5 * 10 ^ -3Pa
Sputtering vacuum:	≤ 10Pa
Type of baffle:	Electric control
Vacuum chamber:	transparent glass chamber with a diameter of 160mm x 160mm
Sample stage:	rotatable with a diameter of 75 (capable of installing a diameter of 68 substrate)
Sample table speed:	8 revolutions per minute
Sample sputtering source adjustment distance:	70-140mm
Evaporation temperature regulation:	≤ 1800 ℃
Support evaporation crucible types:	tungsten blue, tungsten blue with crucible, tungsten boat, carbon rope, ceramic crucible, quartz stone, crucible