High Vacuum Magnetron Sputtering System for Semiconductor Fabrication and Thin Film Deposition

High Vacuum Magnetron Sputtering System for Semiconductor Fabrication and Thin Film Deposition

Product Name: High Vacuum Magnetron Sputtering Equipment

Product Model: VTC-600GD

Product Description: The VTC-600GD high vacuum magnetron sputtering system is a newly developed coating device that can be used to prepare single-layer or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, and polytetrafluoroethylene (PTFE) films.

Product Description

The VTC-600GD high vacuum Magnetron Sputtering System can be optionally equipped with up to four target guns, with a matching RF power supply for sputtering non-conductive target materials and a DC power supply for sputtering conductive materials.

Compared to similar devices, it not only has a wide range of applications but also features a compact design that facilitates operation. It is an ideal device for preparing material films in laboratories, particularly suitable for research on solid-state electrolytes and OLEDs.

Product Features

1. It can be optionally equipped with up to four target guns, with a matching RF power supply for sputtering non-conductive target materials and a DC power supply for sputtering conductive materials (the target guns can be interchanged according to customer needs).

2. The system is capable of preparing various films and has a wide range of applications.

3. Its compact design allows for easy operation.

4. The entire system features a modular design, with a separate vacuum chamber, vacuum pump unit, and control power supply, allowing for adjustments based on user requirements.

5. Users can choose the power supply according to their actual needs; one power supply can control multiple target guns, or multiple power supplies can individually control each target gun.

Product Parameters

Product Name

High Vacuum Magnetron Sputtering System for Semiconductor and Thin Film Deposition

Product Model

VTC-600GD

Installation

Requirements

This equipment must be used under the following conditions: temperature 25°C ± 15°C and humidity 55% RH ± 10% RH.

1. Water: The equipment is equipped with a self-circulating cooling water system (use purified water or deionized water).

2. Electricity: AC 220V, 50Hz, with proper grounding required.

3. Gas: The chamber needs to be filled with argon gas (purity above 99.99%); an argon gas cylinder (with a Ø6mm double ferrule connector) and pressure regulator must be provided by the user.

4. Work Surface: Dimensions 1500mm × 600mm × 700mm, with a load capacity of over 200kg.

5. Ventilation: A ventilation system is required.

Main

Parameters

1. Power Supply Voltage: 220V, 50Hz

2. Total Power: < 3.5KW

3. Chamber Inner Diameter: Ø300mm

4. Ultimate Vacuum: 8.0 × 10^-5 Pa

5. Operating Temperature: RT-500℃, accuracy ±1℃ (temperature can be increased based on actual needs)

6. Number of Target Guns: 4

7. Target Gun Cooling Method: Water cooling

8. Target Material Size: Ø2″, thickness 0.1mm-5mm (thickness may vary depending on the material)

9. DC Sputtering Power: 500W (optional)

10. RF Sputtering Power: 300W

11. Sample Stage: Ø140mm

12. Sample Stage Rotation Speed: Adjustable from 1rpm to 20rpm

13. Protective Gases: Ar, N2, and other inert gases

14. Inlet Gas Path: Mass flow meter controls 2 gas inlets, one with a flow rate of 100 SCCM and the other with a flow rate of 200 SCCM

Product

specifications

Dimensions:

Main Unit Size: 850mm × 760mm × 660mm

Overall Size: 1300mm × 660mm × 1200mm

Weight: 190kg

Standard Accessories

Item No.	Product Name	Qty
1	DC Power Supply Control System	Optional
2	RF Power Supply Control System	1 set
3	Film Thickness Measurement System	1 set
4	Molecular Pump	1 set
5	Chiller	1 set
6	Polyester PU Tube (Ø6mm)	4m

Optional Accessories

Item No.	Product Name	Qty
1	Various target materials such as gold, indium, silver, and platinum	Optional
2	Optional strong magnetic target for sputtering ferromagnetic materials	Optional

High Vacuum <a href=https://www.supsemi.com/en/Thin-Film-Deposition-Equipment.html target='_blank'>Magnetron Sputtering System</a>.jpg