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Processing Equipment

Triple-Target Magnetron Sputtering System for Lab Thin Film

Triple-Target Magnetron Sputte

Compact Dual-Target Magnetron Sputtering System for Laboratory Thin Film Applications

Compact Dual-Target Magnetron

Single Target Magnetron Sputtering System for Lab Thin Film

Single Target Magnetron Sputte

Triple-Target Magnetron Sputtering System for Lab Thin Film

Triple-Target Magnetron Sputte

Small Dual-Target Magnetron Sputtering System Sputter Coater for Thin Films

Small Dual-Target Magnetron Sp

Small Triple-Target Plasma Sputter Coater Sputtering Machine for Thin Films

Small Triple-Target Plasma Spu

Plasma Triple-Target Sputtering System: Three-Target Sputter Coating Solution for Laboratory Applications

Plasma Triple-Target Sputterin

Compact single-target Plasma Sputter Coater Sputtering Equipment for Thin Films

Compact single-target Plasma S

High-Precision Grinder Polisher - CMP Equipment for Wafer Grinding and Polishing in Semiconductor Labs

High-Precision Grinder Polishe

High-Performance Vacuum Evaporator for Thin Film Deposition and Metal Coating – PVD System with Thermal Evaporation and Sputter Coater Capabilities Semiconductor

High-Performance Vacuum Evapor

Small Lab PVD Magnetron Sputtering Vacuum Coating Machine

Small Lab PVD Magnetron Sputte

Small Batch PECVD Furnace System ( CCP type ) for 12 pcs 6-inch Wafer Pilot Test Max 1100C

Small Batch PECVD Furnace Syst

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Contact: Bruce Liu

WhatsApp: +86-18059149998

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Add: Room 1402, Building 1, No. 89 Xibeilu, Xishancun, Xibei Street, Xinluo District, Longyan City, Fujian Province