• Small Dual-Target Magnetron Sputtering System Sput

  The VTC-600-2HD dual-target magnetron sputtering system is a high-vacuum coating device that can be used to prepare single-layer or multi-layer films, including ferroelectric films, conductive films,

• Triple-Target Magnetron Sputtering System for Lab

  The VTC-600-3HD triple-target magnetron sputtering system is a newly developed coating device that can be used to prepare single-layer or multi-layer films, including ferroelectric films, conductive f

• Single Target Magnetron Sputtering System for Lab

  The VTC-600-1HD single-target magnetron sputtering system is a high-vacuum coating device independently developed by our company. It can be used to prepare single-layer or multi-layer ferroelectric

• Compact Dual-Target Magnetron Sputtering System fo

  The SUP-600-2HD-1000 dual-target magnetron sputtering system is a high-vacuum coating device independently developed by our company. It can be used to prepare single-layer or multi-layer ferroelec

• Triple-Target Magnetron Sputtering System for Lab

  The VTC-600-3HD-1000 triple-target magnetron sputtering system is a high-vacuum coating device independently developed by our company. It can be used to prepare single-layer or multi-layer ferroel

• High Vacuum Magnetron Sputtering System for Semico

  The VTC-600GD high vacuum magnetron sputtering system is a newly developed coating device that can be used to prepare single-layer or multi-layer ferroelectric films, conductive films, alloy films, se

• Single-Target Magnetron Sputtering System for Lab

  The VTC-16-1HD single-target magnetron sputtering system is a newly developed high vacuum coating device designed by our company. It can be used to prepare single-layer or multi-layer ferroelectri

• High Vacuum Magnetron Sputtering System for Versat

  The VTC-600G high vacuum magnetron sputtering system is a newly developed coating device that can be used to prepare single-layer or multi-layer ferroelectric films, conductive films, alloy films, sem

• Magnetron Sputtering System for Thin Film Depositi

  The GSL-1100X-SPC-16M magnetron sputtering system utilizes the sputtering effect generated by particle bombardment of the target material in a vacuum environment, causing atoms or molecules to be ejec

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