High-quality CrAl sputtering targets for advanced thin-film deposition. Our CrAl targets offer superior purity, precise composition control, and excellent performance in various applications, includi
Discover high-quality vanadium (V) sputtering targets designed for advanced applications in thin film deposition and semiconductor manufacturing. Our vanadium targets offer excellent corrosion resista
Discover high-quality cobalt sputtering targets for advanced thin film deposition applications. Our cobalt targets are ideal for semiconductor manufacturing, aerospace coatings, and other high-perform
Discover our high-purity aluminum-nickel alloy targets, specifically designed for advanced laboratory applications. With exceptional quality and precision, these sputtering targets are ideal for mater
Enhance your semiconductor manufacturing process with our high-quality nickel sputtering targets. Designed for superior adhesion and reliable thin film deposition, our targets ensure optimal performan
Tantalum Sputtering Target: High-purity tantalum sputtering targets are essential for semiconductor manufacturing. Known for their excellent conductivity, high melting point, and chemical stability, t
Tungsten (W) sputtering targets are essential materials in the field of thin film deposition, particularly in the semiconductor industry. Known for their exceptionally high melting point (approximatel
Titanium sputtering targets are essential materials for thin film deposition processes in various industries. Known for their excellent strength-to-weight ratio, high corrosion resistance, and biocomp
Aluminum sputtering targets are essential materials used in the semiconductor and electronics industries for thin film deposition. Known for their excellent electrical conductivity, lightweight nature
Copper(Cu) sputtering targets are essential materials in the semiconductor and electronics industries, known for their excellent electrical and thermal conductivity. With a high melting point and good
Magnesium Target: Magnesium targets are essential materials used in physical vapor deposition (PVD) processes for thin film applications. Known for their lightweight and excellent conductivity, magnes
TiAlY alloy sputtering targets provide a unique material platform for the deposition of thin films with tailored properties. The precise control over the titanium, aluminum, and yttrium ratio allows f
High-purity Titanium-Molybdenum (TiMo) sputtering targets, customized for various applications in the semiconductor, optics, and decorative coatings industries. Featuring high melting points, exceptio
Source manufacturer of high-purity CuZn sputtering targets. Our products combine excellent quality with affordability, ensuring top performance for semiconductor and decorative applications. Trust us
Explore our high-quality NiCu sputtering targets, ideal for semiconductor applications. Made from high-purity nickel copper alloy, these targets offer excellent electrical conductivity, corrosion resi
High-quality Titanium-Aluminum targets for superior thin-film deposition. Ideal for semiconductor manufacturing, optoelectronics, aerospace, and medical device applications. Enhance performance and du